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H-BN Hexagonal Boron Nitride On Si/SiO2

H-BN Hexagonal Boron Nitride On Si/SiO2

350 INR/Bottle
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Product Details:

  • Smell Odorless
  • Refractive Rate n 2.13 (at 550nm)
  • Ph Level ~7 (Neutral)
  • HS Code 2850.00
  • Other Names h-BN, White Graphite
  • Molecular Formula BN
  • Melting Point ~2973C
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H-BN Hexagonal Boron Nitride On Si/SiO2 Price And Quantity

  • 1 Gram
  • 350 INR/Bottle
  • Long-term stable under proper storage
  • Silicon with thermally grown SiO2
  • High (in-plane ~600 W/m·K)
  • Clean-room packed, vacuum sealed
  • Chemical Vapor Deposition (CVD)
  • Excellent dielectric properties
  • Uniform, smooth, slightly visible contrast under optical microscope
  • Monolayer (~0.33 nm) or few-layer (1-10 nm), as requested
  • <0.5 nm (RMS, typical)
  • High-quality, atomically flat hexagonal crystallinity
  • Typically 285 nm or as specified
  • >90% coverage on SiO2 surface
  • Available in 10 mm x 10 mm, 1 inch, or larger on request

H-BN Hexagonal Boron Nitride On Si/SiO2 Product Specifications

  • 24.82 g/mol
  • Substrate for 2D materials research, electronic and photonic devices, insulation, dielectric layers
  • Thin film/layer on Si/SiO2 substrate
  • 2D material heterostructure
  • 2.1 Gram per cubic centimeter(g/cm3)
  • 10043-11-5
  • BN
  • Store in a dry, dust-free environment at room temperature
  • Insoluble in water and most solvents
  • ~2973C
  • Conforms to laboratory research standards
  • ~7 (Neutral)
  • Used as a substrate layer on Si/SiO2 wafers for advanced material research and device fabrication
  • Odorless
  • n 2.13 (at 550nm)
  • 2850.00
  • h-BN, White Graphite
  • Research Grade
  • Hexagonal Boron Nitride
  • Ceramic, Dielectric, Substrate material
  • Hexagonal Boron Nitride (h-BN)
  • Yes
  • >99%
  • Monolayer/few-layer film
  • 233-136-6
  • Hexagonal layered structure (similar to graphite)
  • Sublimes before boiling
  • Tasteless
  • Long-term stable under proper storage
  • Silicon with thermally grown SiO2
  • High (in-plane ~600 W/m·K)
  • Clean-room packed, vacuum sealed
  • Chemical Vapor Deposition (CVD)
  • Excellent dielectric properties
  • Uniform, smooth, slightly visible contrast under optical microscope
  • Monolayer (~0.33 nm) or few-layer (1-10 nm), as requested
  • <0.5 nm (RMS, typical)
  • High-quality, atomically flat hexagonal crystallinity
  • Typically 285 nm or as specified
  • >90% coverage on SiO2 surface
  • Available in 10 mm x 10 mm, 1 inch, or larger on request

Product Description

Application for h-BN powder:

1. Hexagonal BN (h-BN) is the most widely used polymorph. Another advantage of h-BN over graphite is that its lubricity does not require water or gas molecules trapped between the layers. Therefore, h-BN lubricants can be used even in vacuum, e.g., in space applications. The lubricating properties of fine-grained h-BN are used in cosmetics, paints, dental cements, and pencil leads.

2. Because of its excellent thermal and chemical stability, boron nitride ceramics are traditionally used as parts of high-temperature equipment. h-BN can be included in ceramics, alloys, resins, plastics, rubbers, and other materials, giving them self-lubricating properties.

3. Hexagonal BN is used in xerographic process and laser printers as a charge leakage barrier layer of the photo drum. In the automotive industry, h-BN mixed with a binder (boron oxide) is used for sealing oxygen sensors, which provide feedback for adjusting fuel flow.



Unparalleled Crystallinity for Advanced Research

Our h-BN films are produced with high crystallinity and atomic flatness, ensuring uniform surfaces for precision experiments and device fabrication. The monolayer or few-layer structure delivers superior electrical insulation and thermal conductivity, ideal for next-generation electronics, photonics, and 2D material heterostructures. Clean-room packaging preserves the pristine quality necessary for reproducible, high-performance results.


Highly Compatible Substrate for Emerging Applications

Hexagonal boron nitride on Si/SiO2 is compatible with a wide range of 2D materials and cutting-edge device architectures. It supports advanced research in fields such as nanotechnology, quantum devices, and microelectronics, where dielectric layers and insulation are critical. Extensive wafer size options and over 90% BN coverage facilitate large-scale studies and fabrication.

FAQ's of H-BN Hexagonal Boron Nitride On Si/SiO2:


Q: What is the typical process used to deposit hexagonal boron nitride on Si/SiO2 wafers?

A: The BN layer is grown on silicon wafers with thermally grown SiO2 using chemical vapor deposition (CVD), resulting in an atomically flat, high-quality crystalline structure.

Q: How can h-BN on Si/SiO2 be utilized in research and device fabrication?

A: This material is widely used as an atomically smooth, inert substrate for 2D material research, electronic and photonic device fabrication, and as a high-performance dielectric layer in advanced material heterostructures.

Q: What are the main benefits of using h-BN on Si/SiO2 substrates?

A: Key benefits include exceptional dielectric insulation, high thermal conductivity, robust chemical and thermal stability, and excellent compatibility with various materials, making it ideal for both prototyping and production environments.

Q: When should I choose monolayer versus few-layer h-BN?

A: Monolayer h-BN is preferred for applications requiring minimal thickness and maximum transparency, such as certain 2D material integrations, while few-layer BN provides enhanced dielectric strength and mechanical robustness for more demanding device requirements.

Q: Where should I store h-BN on Si/SiO2 wafers to maintain quality?

A: Store the wafers in a dry, dust-free environment at room temperature. They are shipped vacuum-sealed and clean-room packed to ensure long-term stability when unopened.

Q: How is the surface quality characterized, and what is the surface roughness?

A: Surface quality is evaluated by atomic force microscopy and optical contrast, with roughness values typically under 0.5 nm RMS, ensuring a smooth and uniform film suitable for sensitive applications.

Q: What sizes are available and can custom wafer dimensions be requested?

A: Standard sizes include 10 mm x 10 mm squares and 1-inch wafers; larger dimensions can be accommodated upon request to meet project-specific requirements.

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